参考文献/References:
[1] 张金东,滕雅娣,李旭日,等.硅氮烷的合成与应用研究进展[J].有机化学,2017,27(11):1358-1365.
[2] 黄健,高利珍,付俊杰,等.聚硅氮烷合成方法与应用研究进展[J].化工新型材料,2015,44(8):9-10.
[3] STOCK A,SOMIESKI K.Silicon hydrides.X.Nitrogen containing compounds[J].Berichte der Deutschen Chemischen Gesellschaft,1921,54(4):740-758.
[4] 张宗波,肖凤艳,罗永明,等.全氢聚硅氮烷的应用及产业化[J].精细与专用化学品,2013,21(7):25-28.
[5] Massachusetts Institute Technology.Stable liquid polymeric precursor to silicon nitride and process:US4397828A[P].1983-08-09.
[6] Massachusetts Institute Technology.Preceramic organosilazane polymers:US4482669A[P].1984-11-13.
[7] 东亚染料工业株式会社.氮化硅的生产:JPS59207812A[P].1984-11-26.
[8] 东亚燃料工业株式会社.无机聚硅氮烷及其制备方法:JPS60145903A[P].1985-08-01.
[9] Southwest Research Institute.Polysilazane precursors for silicon nitride and resultant products:US5294425A[P].1994-05-15.
[10] 中国人民解放军国防科学技术大学.一种低分子无碳聚硅氮烷及其液相合成方法:CN102173398A[P].2011-09-07.
[11] EVONIKINDUSTRIES A G.Process for coupled preparation of polysilazanes and trisilylamine:WO2014023470A[P].2014-02-13.
[12] EVONIKINDUSTRIES A G.Method for the coupled preparation of polysilazanes and trisilylamine having a molar mass of up to 500 g·mol-1:WO2014191058A[P].2014-12-03.
[13] 东燃株式会社.具有受控分子量的聚硅氮烷的生产:JPH06200036A[P].1994-07-19.
[14] KionCorp.Novel silazane and/or polysilazane compound and methods of making:WO01036427A1[P].2001-05-25.
[15] 3M Innovative Properties Company.Process for preparing shelf-stable curable polysilazanes and polysilazanes prepared thereby:WO2011079020A[P].2011-06-30.
[16] AZ Electronic Materials(luxembourg)SARL.Inorganic polysilazane resin:WO2013118642A1[P].2013-08-15.
[17] 中国科学院化学研究所.一种分子结构中SiH2和SiH1比例可控的全氢聚硅氮烷和由其制备的疏水透明高硬度涂层及其合成方法:CN104072781A[P].2014-10-01.
[18] 第一毛织株式会社.制备用于形成二氧化硅绝缘膜的聚合物和组合物的方法; KR20140087903A[P].2014-01-27.
[19] AZ Electronic Materials(luxembourg)SARL.The copolymerized polysilazane,manufacturing method therefore,composition comprising same,and method for forming siliceous film using same:WO2015163360A1[P].2015-10-29.
[20] Air Liquid Advanced Materials LLC.N-H free and Si-rich perhydropolysilzanecompositions,their synthesis and application:WO2018107155A1[P].2018-06-14.
[21] L'AIR Liquide,Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude.Perhydropolysilazane compositions and methods for forming oxide films using same:WO2019165093A1[P].2019-08-29.
[22] L'AIR Liquide,Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude.Perhydropolysilazane compositions and methods for forming nitride films using same:WO2019165102A1[P].2019-08-29.
[23] 三星SDI株式会社.用于形成二氧化硅层的组成物、二氧化硅层以及电子装置:CN113528014A[P].2021-10-22.
[24] Toa Nenryo Kogyo Kabushiki Kaisha.Silicon nitride based ceramic fibers, process of preparing same and composite material containing same:US5032551A[P].1991-07-16.
[25] 中国人民解放军国防科技大学.一种陶瓷先驱体无碳聚硼硅氮烷及其合成方法:CN102108125A[P].2011-06-29.
[26] 广州弘海化工科技有限公司.一种改性聚硅氮烷涂料及其制备方法和使用方法:CN107418430A[P].2017-12-01.
[27] AZ Electronic Materials(luxembourg)SARL.Siloxazane compound and composition com prising the same,and method for producing silceous film usingthe same:WO2018095887A1[P].2018-05-31.
[28] Korean Institute of Industrial Technology.具有高硬度和高透明度的薄膜及其制造方法:KR101900000B1[P].2018-09-18.
[29] Korean Institute of Industrial Technology.引入氟基团的氟-聚硅氮烷材料及其制备方法:KR20190060576A[P].2019-06-03.
[30] 中国科学院化学研究所.一种聚硅氧烷/全氢聚硅氮烷杂化聚合物及其合成方法:CN109485853A[P].2019-03-19.
[31] 东燃株式会社.氮化硅纱线的生产:JPS6445817A[P].1989-03-06.
[32] Clariant International Ltd.Method for producing thermoplastic pre-ceramic polymers:WO2014032817A[P].2014-03-06.
[33] AZ Electronic Materials(luxembourg)SARL.Perhydropolysilazane,composition containing same and method for forming silica film using same:WO2015087847A[P].2015-06-18.
[34] Konica Minolta Inc.Modified polysilazane coating solution containing said modified polysilazane,and gas barrier film produced using said coating solution:WO2015119260A[P].2015-08-13.
[35] AZ Electronic Materials(luxembourg)SARL.Hybrid material for use as coating means in optoelectronic components:WO2016016260A[P].2016-02-04.
[36] 东燃株式会社.热固性共聚物及其制备方法:JPH0586200A[P].1993-04-06.
[37] 第一毛织株式会社.填充间隙的填料、其制备方法及制备半导体电容器的方法:CN102874813A[P].2013-01-16.
[38] Merck Patent Gmbh.Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton:WO2019233838A1[P].2019-12-12.
[39] Merck Patent Gmbh.Amorphous silicon forming composition comprising block copolymer and method for producing amorphous silicon film using same:WO202010928A1[P].2020-04-06.
[40] Merck Patent Gmbh.Method for producing amorphous silicon sacrifice film and amorphous silicon forming composition:WO2020109301A1[P].2020-04-06.
[41] Merck Patent Gmbh.Silicous film forming composition comprising block copolymer and method for producing siliceous film using same:WO2020127413A1[P].2020-06-25.